Staff Researcher - Selective Area Deposition By Atomic Layer Deposition For Microelectronics

Staff Researcher - Selective Area Deposition By Atomic Layer Deposition For Microelectronics
Empresa:

International Iberian Nanotechnology Laboratory (Inl)


Lugar:

Portugal


Função de trabalho:

Pesquisa

Detalhes da Vaga

.Staff Researcher - Selective Area Deposition by Atomic Layer Deposition for Microelectronics Job Reference: Ref.04.24.23/1 Employer: International Iberian Nanotechnology Laboratory (INL) Location: Braga, Portugal Group/Unit: Salomé Research Group Number of Vacancies: 1 Employment Type: Full time Contract Duration: 36 months Open Date for Applications: August 22nd, 2024 Closing Date for Applications: September 22nd, 2024, 23h00m (Lisbon Time) Key words: #AtomicLayerDeposition(ALD) #SelectiveAreaDeposition(SAD) #surfacecharacterisation #nanofabrication Overview The Salomé Research Group is dedicated to developing nanofabrication and applications for optoelectronics and energy. We are looking for a qualified Researcher to join our team in developing area selective deposition (SAD) based on atomic layer deposition (ALD) processes. This project will involve collaboration with a multinational semiconductor company to develop clean room nanofabrication processes compatible with industry needs in microelectronics. Job Duties Experimental Design and Execution: Develop experimental strategies for selective area deposition using ALD; Execute experiments ensuring reproducibility and accuracy. Process Optimisation: Optimise ALD processes for selective area deposition; Explore parameter spacesystematically. Characterisation and Analysis: Perform comprehensive characterisation of deposited films; Analyse data to assess film quality and other properties. Collaboration and Communication: Collaborate with partners to understand project goals; Communicate findings effectively. Mandatory Qualifications Education: PhD in Physics, Chemistry, Materials Science or related areas. Experience: 4 years Postdoctoral or industry experience in ALD and/or SAD; Track record of research publications. Technical Skills: Hands-on experience with ALD techniques; Proficiency in area-selective deposition methodologies. Other Skills: Ability to design experiments, analyse data, and mentor junior researchers. Preferred Qualifications Previous experience in semiconductor or microelectronics industries. Experience in academic and industrial collaborations. Active participation in relevant conferences and workshops. Personal Skills Ability to work independently and as part of a team. Attention to detail and commitment to quality. Strong problem-solving and analytical skills. Excellent communication skills. Our Benefits Competitive salary Tax benefits and other Diplomatic privileges Private health insurance Family allowances Free nursery service (subject to availability) Support for education fees of dependent children Relocation support 30 working days of annual leave How to Apply The application must be in English and include the following mandatory documents: Cover letter Curriculum Vitae Academic and/or Professional diplomas The application is made online by clicking the "Apply" button below; incomplete applicationswill not be considered


Fonte: Jobtome_Ppc

Função de trabalho:

Requisitos

Staff Researcher - Selective Area Deposition By Atomic Layer Deposition For Microelectronics
Empresa:

International Iberian Nanotechnology Laboratory (Inl)


Lugar:

Portugal


Função de trabalho:

Pesquisa

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