Staff Researcher - Selective Area Deposition By Atomic Layer Deposition For Microelectronics

.Description Staff Researcher - Selective area deposition by atomic layer deposition for microelectronics Job Reference: Ref.04.24.23/1 Employer: International Iberian Nanotechnology Laboratory (INL) Location: Braga, Portugal Group/Unit: Salomé Research Group Number of Vacancies: 1 Employment Type: Full time Contract Duration: 36 months Open Date for Applications: August 22nd, 2024 Closing Date for Applications: September 22nd, 2024, 23h00m (Lisbon Time) Key words: #AtomicLayerDeposition(ALD) #SelectiveAreaDeposition(SAD) #surfacecharacterisation #nanofabrication Overview The Salomé Research Group is dedicated to developing nanofabrication and applications for optoelectronics and energy. Focused on developing nanofabrication solutions for a diverse set of applications, via several mechanisms such as competitive funding projects and industrial services. The group aims to keep advancing the state-of-the-art in several areas. We are looking for a qualified Researcher to join our team in developing area selective deposition (SAD) based on atomic layer deposition (ALD) processes. We will develop work in collaboration with a multinational semiconductor company with the aim of developing clean room nanofabrication processes compatible with the mid-term industry needs in the area of microelectronics. The three-year project consists of the procurement and installation of a ALD tool tailored for SAD and the development of nanometre scale processes that are compatible with advanced micro-electronics high end fabrication. This project will place the researcher and INL in a unique position worldwide allowing for the developed processes to be implemented by the industrial partner in several applications. Job Duties The job duties will be the following: Experimental Design and Execution: Develop experimental strategies and protocols for selective area deposition using ALD, considering parameters such as substrate material, surface preparation, precursor choice, and deposition conditions; Execute experiments meticulously, ensuring reproducibility and accuracy in results. Process Optimisation: Optimise ALD processes for selective area deposition, aiming for precise control over film thickness, uniformity, and conformity on targeted areas; Explore parameter spacesystematically, employing techniques such as Design of Experiments (DOE) to identify optimal process conditions. Characterisation and Analysis: Perform comprehensive characterisation of deposited films using techniques such as ellipsometry, X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), and scanning electron microscopy (SEM); Analyse data to assess film quality, uniformity, adhesion, and other relevant properties