Staff Researcher - Selective Area Deposition By Atomic Layer Deposition For Microelectronics

Staff Researcher - Selective Area Deposition By Atomic Layer Deposition For Microelectronics
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Atomic Layer Deposition



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Staff Researcher - Selective area deposition by atomic layer deposition for microelectronicsEmployer: International Iberian Nanotechnology Laboratory (INL)Group/Unit: Nanofabrication, Optoelectronics and Energy ApplicationsNumber of Vacancies: 1Employment Type: Full timeContract Duration: 36 monthsOpen Date for Applications: May 13th, 2024Closing Date for Applications: June 26th, 2024, 23h00m (Lisbon Time)OverviewThe Nanofabrication, Optoelectronics, and Energy Applications Research Group is dedicated to developing nanofabrication and applications for optoelectronics and energy. We are looking for a qualified Researcher to join our team in developing area selective deposition (SAD) based on atomic layer deposition (ALD) processes.Job DutiesExperimental Design and Execution:Develop experimental strategies and protocols for selective area deposition using ALD; Execute experiments meticulously, ensuring reproducibility and accuracy in results.Process Optimisation:Optimise ALD processes for selective area deposition; Explore parameter space systematically.Characterisation and Analysis:Perform comprehensive characterisation of deposited films; Analyse data to assess film quality and other relevant properties.Collaboration and Communication:Collaborate closely with internal and external partners; Communicate research findings effectively.Mandatory QualificationsEducationPhD in Physics, Chemistry, Materials Science or related areas.Experience4 years Postdoctoral or industry experience in ALD and/or area selective deposition; Track record of conducting and publishing research in peer-reviewed journals.Technical SkillsHands-on experience with ALD techniques; Proficiency in area-selective deposition methodologies; Knowledge of surface chemistry and material characterisation techniques.Other SkillsAbility to design and execute experiments, analyse data; Experience in managing research projects; Ability to mentor and supervise junior researchers.How to ApplyThe application must be in English and include the following mandatory documents:Academic and/or Professional diplomasOnline application instructions:The application is made online by clicking the "Apply" button; The candidate must complete all required sections of the online application form; The candidate must submit the mandatory documents in pdf format.About INLThe International Iberian Nanotechnology Laboratory – INL is the first and only Intergovernmental Organisation in the world entirely focused on Nanoscience and Nanotechnology.#J-18808-Ljbffr


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Staff Researcher - Selective Area Deposition By Atomic Layer Deposition For Microelectronics
Empresa:

Atomic Layer Deposition



Função de trabalho:

Pesquisa

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