Staff Researcher - Selective Area Deposition By Atomic Layer Deposition For Microelectronics

.DescriptionStaff Researcher - Selective area deposition by atomic layer deposition for microelectronicsJob Reference: Ref.04.24.23/1Employer: International Iberian Nanotechnology Laboratory (INL)Location: Braga, PortugalGroup/Unit: Salomé Research GroupNumber of Vacancies:1Employment Type: Full timeContract Duration: 36 monthsOpen Date for Applications: August 22nd, 2024Closing Date for Applications: September 22nd, 2024, 23h00m (Lisbon Time)Key words:#AtomicLayerDeposition(ALD) #SelectiveAreaDeposition(SAD) #surfacecharacterisation #nanofabricationOverviewThe Salomé Research Group is dedicated to developing nanofabrication and applications for optoelectronics and energy. Focused on developing nanofabrication solutions for a diverse set of applications, via several mechanisms such as competitive funding projects and industrial services. The group aims to keep advancing the state-of-the-art in several areas.We are looking for a qualified Researcher to join our team in developing area selective deposition (SAD) based on atomic layer deposition (ALD) processes. We will develop work in collaboration with a multinational semiconductor company with the aim of developing clean room nanofabrication processes compatible with the mid-term industry needs in the area of microelectronics.The three-year project consists of the procurement and installation of a ALD tool tailored for SAD and the development of nanometre scale processes that are compatible with advanced micro-electronics high end fabrication. This project will place the researcher and INL in a unique position worldwide allowing for the developed processes to be implemented by the industrial partner in several applications.Job DutiesThe job duties will be the following:Experimental Design and Execution:Develop experimental strategies and protocols for selective area deposition using ALD, considering parameters such as substrate material, surface preparation, precursor choice, and deposition conditions; Execute experimentsmeticulously, ensuring reproducibility and accuracy in results.Process Optimisation:Optimise ALD processes for selective area deposition, aiming for precise control over film thickness, uniformity, and conformity on targeted areas; Explore parameter space systematically, employing techniques such as Design of Experiments (DOE) to identify optimal process conditions.Characterisation and Analysis:Perform comprehensive characterisation of deposited films using techniques such as ellipsometry, X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), and scanning electron microscopy (SEM); Analyse data to assess film quality, uniformity, adhesion, and other relevant properties